首页> 外文会议>Conference on Lasers and Electro-Optics >Optical study of Ge_(0.95)Sn_(0.05)/Ge_(0.9)Sn_(0.1)/Ge_(0.95)Sn_(0.05) quantum well towards group-IV based light source on Si
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Optical study of Ge_(0.95)Sn_(0.05)/Ge_(0.9)Sn_(0.1)/Ge_(0.95)Sn_(0.05) quantum well towards group-IV based light source on Si

机译:GE_(0.95)SN_(0.05)/ GE_(0.9)SN_(0.1)/ GE_(0.95)SN_(0.05)量子孔对SI的Grous-IV基光源进行

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A Ge_(0.95)Sn_(0.05)/Ge_(0.9)Sn_(0.1)/Ge_(0.95)Sn_(0.05) single quantum well was grown on Si via chemical vapor deposition. Temperature-dependent Photoluminescence shows the emission peak from the GeSn well. The studied structure aims for group-IV based efficient light source on Si.
机译:GE_(0.95)SN_(0.05)/ GE_(0.9)SN_(0.1)/ GE_(0.95)SN_(0.05)单量子通过化学气相沉积在Si上生长。温度依赖性光致发光显示来自GESN的发射峰。研究结构旨在Si上基于IV组的高效光源。

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