A precision micromachining technique for the fabrication of hybrid millimeter wave circuits and sub-assemblies

摘要

A high precision and cost effective micromachining technique has been developed to produce a range of complex waveguide components. These components are fabricated using the negative photoresist SU-8, and have high dimensional accuracy and an excellent surface quality. The technique is ideal for the straightforward production of low cost millimeter and submillimeter wave circuits and complex integrated subsystems with high electrical performance. Device integration is straightforward and measurements are presented for various compact hybrid circuits up to 325 GHz. The approach is suited for mass production and is able to exploit the strength of both the planar and 3-D circuits.