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Intel Ivy Bridge unveiled — The first commercial tri-gate, high-k, metal-gate CPU

机译:Intel Ivy Bridge亮相 - 第一个商用三门,高k,金属门CPU

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The year 2007 saw the introduction of the first high-k/metal gate (HKMG) devices into the marketplace. This marked the return of metal-gate technology on silicon for the first time since polysilicon gates became ubiquitous in the early 1970s. Intel was the first to use high-k/metal gate in its 45-nm product. Other leading-edge manufacturers have now launched HKMG products in both gate-first and gate-last forms, and now the first 22-nm FinFET products have come onto the market — the Intel Ivy Bridge CPU. Chipworks, as a supplier of competitive intelligence to the semiconductor and electronics industries, monitors the evolution of chip processes as they come into commercial production. Chipworks has obtained samples of this leading-edge part and performed structural analyses to examine the features and manufacturing processes of the device. This paper discusses some of the different features we have seen within the chip, and illustrates the structure of the tri-gate transistors.
机译:2007年的推出将第一高K /金属门(HKMG)设备引入市场。这在20世纪70年代初,这首先标志着金属栅极技术在硅上的回报是第一次在20世纪70年代初到普遍存在。英特尔是第一个在其45纳米产品中使用高k /金属门的产品。其他领先的制造商现在已经在栅极 - 第一和栅极 - 最后一个形式推出了HKMG产品,现在前22纳米FINFET产品已进入市场 - 英特尔常春藤桥CPU。芯片制品是作为半导体和电子行业的竞争情报供应商,监控芯片过程的演变,因为它们进入商业生产。芯片制品已经获得了该领先边缘部分的样本并执行了结构分析以检查设备的特征和制造过程。本文讨论了我们在芯片内看到的一些不同的特征,并说明了三栅极晶体管的结构。

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