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A 64-Bit Arm CPU at Cryogenic temperatures: Design Technology Co-Optimization for Power and Performance

机译:低温温度的64位臂CPU:设计技术协同功率和性能

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Compute demand has grown over 100X within the last decade and has well surpassed the growth in classical Moore’s Law transistor density (Fig. 1 (a) [1]). Plateaued dimension scaling even with fin depopulation, short channel effects and shrinking wire dimensions (leading to exponential rise in resistance) have made matters worse. Modern microprocessor designs are now equally limited by transistor and wire performance (e.g., Fig. 1 (b)). Thus, advancements in both transistors and interconnects are needed alongside new architectures to meet the datacenter and High-Performance Computing (HPC) demands. Low-temperature CMOS has emerged as a potential way to provide the needed process technology advancement [2], [3]. Operating CMOS at low temperatures (down to $sim77K)$ improves transistor carrier mobility $(mu)$, subthreshold swing (SS) and source/drain resistances, but also increases transistor threshold voltage, Vth, (due to Fermi potential shift and bandgap widening [4]). Despite the increased Vth, overall performance improvements with low temperature CMOS have been demonstrated with appropriate process changes [5]. Additionally, bulk resistivity of wires also improves with temperature reduction [10].
机译:计算需求在过去十年内已经超过100倍,并且良好地超过了经典摩尔的定律晶体​​管密度的增长(图1(a)[1])。柔韧的维度缩放即使用鳍缺水,短沟道效应和缩小线尺寸(导致阻力指数上升)也使得更糟糕。现代微处理器设计现在由晶体管和线材性能(例如,图1(b))同样限制。因此,晶体管和互连中的进步是必需的,以及新架构以满足数据中心和高性能计算(HPC)需求。低温CMOS已成为提供所需工艺技术进步[2],[3]的潜在方法。在低温下的CMOS(下降到$ SIM77K)$改善晶体管载体移动$( mu)$,亚阈值摆动(SS)和源/漏电,还增加晶体管阈值电压,V th (由于费米电位偏移和带隙加宽[4])。尽管v增加了 th ,通过适当的过程变化进行了对低温CMOS进行整体性能改进[5]。另外,电线的散装电阻率也随温度降温而改善[10]。

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