A vacuum-UV F2 laser of 157 nm wavelength induced strong oxidation of Fe thin film surface to show the chemical resistance to pseudo seawater and HNO3 aqueous solution for selective metallization on silica glass substrate. The strong oxidation reactions on the surface and in the depth direction were confirmed by X-ray photoelectron spectroscopy. The corrosion resistance of the F2 laser irradiated samples was also supported by an electrochemical test. A fine pattern of the F2 laser irradiated Fe thin film was successfully formed after the HNO3 chemical etching.
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机译：157 nm波长的真空UV F 2 激光诱导了Fe薄膜表面的强氧化，显示出对拟海水和HNO 3 水溶液的化学耐受性，可在其上进行选择性金属化石英玻璃基板。通过X射线光电子能谱确认了在表面和深度方向上的强氧化反应。 F 2 激光辐照样品的耐蚀性也得到电化学测试的支持。 HNO 3 化学刻蚀成功地形成了F 2 激光辐照的Fe薄膜的精细图案。
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