首页> 外文会议>ASME international mechanical engineering congress and exposition;IMECE2011 >CLOSED FORM SOLUTIONS FOR THE PROBLEM OF STATICAL BEHAVIOR OF NANO/MICROMIRRORS UNDER THE EFFECT OF CAPILLARY FORCE AND VAN DER WAALS FORCE
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CLOSED FORM SOLUTIONS FOR THE PROBLEM OF STATICAL BEHAVIOR OF NANO/MICROMIRRORS UNDER THE EFFECT OF CAPILLARY FORCE AND VAN DER WAALS FORCE

机译:毛细管力和范德华力作用下纳米/微镜的统计行为问题的封闭形式解

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The current paper deals with the problem of static instability of Micro/Nano mirrors under the combined effect of capillary force and van der Waals force. First the governing equations of the statical behavior of Micro/Nano mirrors under the combined effect of capillary force and casimir force is obtained using the newtons first law of motion. The dependence of the critical tilting angle on the physical and geometrical parameters of the nano/micromirror and its supporting torsional beams is investigated. It is found that existence of vdW torque can considerably reduce the stability limits of the nano/micromirror. It is also found that rotation angle of the mirror due to capillary force highly depends on the vdW toque applied to the mirror. Finally analytical tool Homotopy Perturbation Mehtod (HPM) is utilized for prediction of the nano/micromirror behaviour under combined capillary and vdW force. It is observed that a sixth order perturbation approximation accurately predicts the rotation angle and stability limits of the mirror. Results of this paper can be used for successful fabrication of nano/micromirrors using wet etching process where capillary force plays a major role in the system.
机译:本文研究了在毛细作用力和范德华力共同作用下的微/纳米反射镜的静态不稳定性问题。首先,利用牛顿第一运动定律,求得了微/纳米镜在毛细作用力和卡西米尔力共同作用下的静态行为的控制方程。研究了临界倾斜角对纳米/微镜及其支撑扭力梁的物理和几何参数的依赖性。已经发现,vdW转矩的存在可以大大降低纳米/微镜的稳定性极限。还发现由于毛细作用力引起的反射镜的旋转角度高度取决于施加到反射镜的vdW转矩。最后,利用分析工具同伦摄动法(HPM)来预测在毛细管和vdW组合力作用下的纳米/微镜行为。观察到六阶摄动近似准确地预测了反射镜的旋转角度和稳定性极限。本文的结果可用于通过湿法蚀刻工艺成功制造纳米/微镜,其中毛细作用力在系统中起主要作用。

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