首页> 外文会议>2011 Conference on Lasers and Electro-Optics Europe and 12th European Quantum Electronics Conference >Controllable bumps and holes fabrication on the surface of fused silica by processing bulk material with ultrashort laser pulses
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Controllable bumps and holes fabrication on the surface of fused silica by processing bulk material with ultrashort laser pulses

机译:通过使用超短激光脉冲处理块状材料,可控制熔融石英表面上的凹凸和孔加工

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摘要

Processing of bulk transparent dielectrics with ultrashort laser pulses is widely used for direct writing of waveguides, gratings, couplers and other photonics devices inside the volume of material [1]. This technique is based on the modification of bulk glass material or voids formation, which depends on processing conditions.
机译:用超短激光脉冲处理块状透明电介质被广泛用于在材料体积内直接写入波导,光栅,耦合器和其他光子学设备[1]。该技术基于对块状玻璃材料或空隙形成的修改,这取决于加工条件。

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