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Mechanisms of electrochemical migration of tin by in-situ optical and electron microscopy

机译:锡的原位光学和电子显微镜电化学迁移机理

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The times when electronic devices where expensive, high-end items, that were being taken well care off, are far gone, and today electronic devices are to be regarded as consumables that can be expected to be brought practically anywhere on the planet's surface. This has created challenges to electronic manufacturers, as device reliability is extremely hard to predict before a product is launched, and even the slightest change from a sub-supplier could potentially lead to catastrophic changes in the corrosion behavior of the device. Electrochemical migration in electronics is a process that occurs when two metallic conductors under a potential bias are connected by an aqueous electrolyte, which commonly originates from condensation of humidity from the external environment. Prone metals, such as i.e. Sn, Cu, Ag, Au, Ni, Pb, Pd [1] can be dissolved at the anode and migrate under the electric field to the cathode where they can be deposited in their reduced metallic state. The result can be the growth of a dendrite acting as a metallic bridge from cathode to anode, which short-circuits the two conductors with potential failure of the electronic circuit as a consequence. The main metals that are directly exposed to the environment on a common Printed Circuit Board Assembly (PCBA) are tin and tin solders, making the corrosion mechanisms of these in electronics a very important subject. Electrochemical migration of tin is an extremely delicate process, where even the slightest impurities on the surface can have a profound impact on the migration behavior. For this reason, an extensive research has been conducted over the past years, in order to understand the migration mechanisms of tin and how it is affected by various parameters. A novel chip has been developed, where a nanoscale silicon nitride window allows making in-situ electron microscopy observations of electrochemical phenomena, such as electrochemical migration [2]. This presentation will give an overview of the chemical, electrochemical and thermodynamic mechanisms of the electrochemical migration of tin with examples from in-situ observation from optical and electron
机译:电子设备中需要妥善保管昂贵的高端物品的时代已经不复存在了,如今,电子设备被视为可消费的产品,可以预期将其带到地球表面上的几乎任何地方。这给电子制造商带来了挑战,因为在产品发布之前很难预测设备的可靠性,即使是次级供应商的最微小变化也可能导致设备腐蚀行为的灾难性变化。电子设备中的电化学迁移是一个过程,当在电位偏置下的两个金属导体通过水性电解质连接时,通常是由于外部环境中的湿气凝结而引起的。诸如Sn,Cu,Ag,Au,Ni,Pb,Pd [1]等易溶金属可在阳极处溶解,并在电场下迁移至阴极,并在其中以还原的金属态沉积。结果可能是树枝状晶体的生长,该枝状晶体充当从阴极到阳极的金属桥,这会使两个导体短路,从而导致电子电路的潜在故障。普通印刷电路板组件(PCBA)上直接暴露于环境中的主要金属是锡和锡焊料,这使其在电子设备中的腐蚀机理成为非常重要的主题。锡的电化学迁移是一个极其微妙的过程,即使表面上的最细微杂质也会对迁移行为产生深远影响。因此,在过去的几年中进行了广泛的研究,以了解锡的迁移机理以及各种参数对锡的影响。已经开发出了一种新型芯片,其中纳米级氮化硅窗口允许对电化学现象(例如电化学迁移)进行原位电子显微镜观察[2]。本演讲将概述锡的电化学迁移的化学,电化学和热力学机理,并提供光学和电子现场观察的实例

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