首页> 外文会议>2010 10th IEEE International Conference on Solid-State and Integrated Circuit Technology >22 nm node Si SOI Coplanar N Channel Vertical Dual Carrier Field Effect Transistor and its SOC with channel length less than 10nm for communication applications
【24h】

22 nm node Si SOI Coplanar N Channel Vertical Dual Carrier Field Effect Transistor and its SOC with channel length less than 10nm for communication applications

机译:用于通信应用的22 nm节点Si SOI共面N沟道垂直双载流子场效应晶体管及其SOC,沟道长度小于10nm

获取原文

摘要

22nm node Si SOI Coplanar “N Channel Vertical Dual Carrier Field Effect Transistors” (VDCFET) and its SOC with effective channel length less than 10nm for communication applications are presented.
机译:介绍了用于通信应用的22nm节点Si SOI共面“ N沟道垂直双载流子场效应晶体管”(VDCFET)及其有效沟道长度小于10nm的SOC。

著录项

相似文献

  • 外文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号