首页> 外文会议>Solid-State Circuits Conference Digest of Technical Papers (ISSCC), 2010 >A configurable SRAM with constant-negative-level write buffer for low-voltage operation with 0.149µm2 cell in 32nm high-k metal-gate CMOS
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A configurable SRAM with constant-negative-level write buffer for low-voltage operation with 0.149µm2 cell in 32nm high-k metal-gate CMOS

机译:具有恒定负电平写缓冲器的可配置SRAM,可在32nm高 k 金属栅CMOS中以0.149µm 2 单元进行低压操作

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This paper presents a configurable SRAM with 0.149 ¿nf cell in 32 nm high-k metal-gate CMOS. Constant-negative-level write buffer adjusts bitline level automatically for configuration range of four to 512 cells/bitline, improving write margin at low voltage. Measurement results demonstrate that cell-failure-rate improves by two orders of magnitude at 0.5 V.
机译:本文介绍了32nm高k金属门CMOS中的0.149±Ã,¿nf电池的可配置SRAM。恒定负级写缓冲区自动调整位线级,用于配置4到512个单元/位线的配置范围,在低电压下提高写余量。测量结果表明,细胞猝灭速率在0.5V下提高了两个数量级。

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