首页> 外文会议>International symposium on photoelectronic detection and imaging;ISPDI 2009 >Optimization Designed Frame Transfer Area Array Sensor with Vertical Antiblooming Structure by The CAD Tools
【24h】

Optimization Designed Frame Transfer Area Array Sensor with Vertical Antiblooming Structure by The CAD Tools

机译:利用CAD工具优化设计垂直防起霜结构的框架传输区域阵列传感器。

获取原文

摘要

The frame transfer Area Array Sensor with vertical antiblooming structure requires that all performance characteristics such as large charge capacity, high charge transfer efficiency, low read noise and low antiblooming voltage be optimized in a singlemanufacturable CCD (charge-coupled device). There is a common tendency to optimize one performance characteristic at the expense of others. With the goal of optimizing above all performance characteristics, a frametransfer area array sensors with vertical antiblooming structure is optimization designed by the CAD ( computer aided design ) tools and fabricated , which equal to twenty-six micron square pixel size with 516 ( H ) ×1028 ( v ) activepixels(the channel stop is 4μm and the photosensitive area is 22×22 μm×μm). At first , it is simply introduced the modeling of the frame transfer area array sensors with vertical antiblooming structure from the top to down and simulated by the CAD tools combined with the process and device models. The essential design and calculation of the CCD with antiblooming function are discussed in detail. And the process, layout and device parameters to design this frame transfer area array sensors (including the impurity concentration and layer thickness of the P-well and the buried-channel , and the design output amplifier) are optimized according to the above simulation. At the last, the device is fabricated and the performance characteristics ( e.g. charge capacity, charge transfer efficiency, read noise andantiblooming voltage ) are test to compare the simulation. To demonstrate the process used to optimize this frame transfer area array sensors with vertical antiblooming structure, this paper contains test data for this kind of CCD device which is optimization designed and fabricated by the CAD ( computer aided design ) tools. The test datas shows the way using the CAD tools optimization design a frame transfer area array sensors with vertical antiblooming structure correct.
机译:具有垂直抗起霜结构的帧传输区域阵列传感器要求在单个可制造的CCD(电荷耦合器件)中优化所有性能特征,例如大电荷容量,高电荷传递效率,低读取噪声和低抗起霜电压。存在以牺牲其他性能为代价来优化一个性能特征的普遍趋势。为了最重要的是优化性能特征,一个框架 利用CAD(计算机辅助设计)工具优化设计并制作了具有垂直抗浮斑结构的转移区域阵列传感器,该传感器等于26微米正方形像素尺寸,有源516(H)×1028(v) 像素(通道光阑为4μm,感光面积为22×22μm×μm)。首先,简单介绍了从上到下具有垂直防喷结构的帧传输区域阵列传感器的建模,并通过CAD工具与过程和设备模型相结合进行了仿真。详细讨论了具有抗起霜功能的CCD的基本设计和计算。以及设计此帧传输区域阵列传感器的过程,布局和设备参数(包括P阱和掩埋的杂质浓度和层厚度) 通道,以及设计输出放大器)根据上述仿真进行了优化。最后,完成了设备的制造并获得了性能特征(例如充电容量,电荷转移效率,读取噪声和 进行了抗起霜电压测试以比较仿真。为了演示优化具有垂直抗起霜结构的帧传输区域阵列传感器的过程,本文包含由CCD工具(由计算机辅助设计)优化设计和制造的这种CCD器件的测试数据。测试数据显示了使用CAD工具优化设计正确的垂直防喷结构的帧传输区域阵列传感器的方式。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号