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INTERACTION OF DISLOCATIONS WITH INTERFACES IN NANOSCALE MULTILAYERED METALLIC COMPOSITES

机译:纳米多层金属复合材料中位错与界面的相互作用

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Atomistic simulation studies of dislocation nucleation and propagation in nanoscale multilayered metallic systems (Cu-Ni and Cu-Nb) are performed. Nanoindentation model is used to generate dislocations at and near the surface. Interaction of the propagating dislocations with two types of interfaces (coherent and incoherent) is analyzed. In the case of coherent interface, Cu(111)-Ni(111), dislocations that initiate in Cu layer propagate through the interface into Ni. However, the interface acts as an obstacle for dislocation propagation and leads to a higher dislocation density near the interface. In the case of incoherent interface, Cu(111)-Nb(110), dislocations that initiate in Cu do not propagate into Nb and tend to accumulate in copper near the interface. In both cases, the interfaces provide mechanisms for strengthening the nanoscale multilayered metallic systems.
机译:进行了原子级纳米多层金属系统(Cu-Ni和Cu-Nb)中位错成核和扩散的原子模拟研究。纳米压痕模型用于在表面及其附近产生位错。分析了传播的位错与两种类型的界面(相干和非相干)的相互作用。在相干界面Cu(111)-Ni(111)的情况下,在Cu层中引发的位错通过界面传播到Ni中。然而,界面充当位错传播的障碍并且导致界面附近更高的位错密度。在非相干界面Cu(111)-Nb(110)的情况下,在Cu中引发的位错不会传播到Nb中,而倾向于在界面附近的铜中积累。在两种情况下,界面都提供了用于增强纳米级多层金属系统的机制。

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