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Behavior of Stacking Faults in TEDREC Phenomena for 4.5 kV SiCGT

机译:4.5 kV SiCGT在TEDREC现象中的堆叠故障行为

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The behavior of stacking faults with regard to V_f degradations and TEDREC phenomena for 4.5 kV SiCGT have been investigated through the use of light emission images. Stacking faults, which cause V_f degradations, are expanded when current densities are increased. A novel phenomena of V_f degradation reduction, TEDREC phenomena, was found, which can reduce degradation by increasing operating temperature. It was observed for the first time that stacking faults become inactive by elevating temperatures to more than 150 °C in spite of existing stacking faults, which is a factor that contributes to TEDREC phenomena.
机译:通过使用光发射图像,已经研究了有关4.5 kV SiCGT的V_f退化和TEDREC现象的堆垛层错行为。当电流密度增加时,会引起导致V_f下降的堆叠故障。发现了一种新的V_f退化降低现象,即TEDREC现象,可以通过提高工作温度来降低退化。首次观察到,尽管存在堆叠故障,但通过将温度升高到150°C以上,堆叠故障变得不活跃,这是导致TEDREC现象的一个因素。

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