Study of the fabrication process of bragg gratings in channel waveguides using ultrafast radiation and the phase mask method

摘要

A study of the capability of the Bragg grating writing method using infrared radiation and a phase mask to inscribe Bragg gratings structures in channel waveguides was performed using as a physical model D-shaped silica fibers. Experiments made with different radiation intensities and focusing arrangements produced surface structure damage of the waveguide during Bragg grating inscription in the D-fiber core. An evaluation of the surface damage intensity threshold and the exposure conditions required to avoid it is presented.