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The Mechanical Study on a Closed and V Style MEMS Planar Microspring

机译:封闭和V型MEMS平面微弹簧的力学研究

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The V style MEMS microspring is a wholly closed microspring. To analyze its stiffness, the mathematics formula about the relationship between the stiffness and parameters of microspring should be presented. The mechanics model of the V style planar microspring was established in the paper. The calculation formula of spring constant about V style microspring in the linear range was derived by the Castigliano's second theorem of energy method and the deformation in the linear was simulated by Finite Element Analysis (FEA) ANSYS software. The simulation results are tally with the formula results in the linear range but not in the nonlinear range. Adopting deep Ultraviolet lithography of SU-8 photoresist to replace the expensive synchrotron radiation lithography of LIGA technology, the nickel standard sample and V style nickel microspring which included four atomic-elements were produced. Then the stress-strain curve and the force-displacement curve were gained. In the linear range,the experiment data are tally with the formula results,which shows the correctness of the formula and the theory analysis.
机译:V STYL MEMS MICRAPRING是全封闭的微粒。为了分析其刚度,应呈现关于微粒之间关系的数学公式。纸上建立了V Style Planar MicroSpring的力学模型。线性范围内的弹簧常数的计算公式由Castigliano的能量方法的第二次定理导出,并且通过有限元分析(FEA)ANSYS软件模拟线性的变形。模拟结果与配方导致线性范围但不在非线性范围内的仿真结果。采用SU-8光致抗蚀剂的深紫外光刻,以取代LIGA技术的昂贵的同步辐射光刻,产生包括四个原子元素的镍标准样品和v样式镍微粒。然后获得了应力 - 应变曲线和力 - 位移曲线。在线性范围内,实验数据与公式结果进行计,显示出式和理论分析的正确性。

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