首页> 外文会议>Proceedings of ISES Solar World Congress 2007: Solar Energy and Human Settlement >PREPARATION OF CHALCOPYRITE CuInSe2 THIN FILMS BY PULSE-PLATING ELECTRODEPOSITION AND ANNEALING TREATMENT
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PREPARATION OF CHALCOPYRITE CuInSe2 THIN FILMS BY PULSE-PLATING ELECTRODEPOSITION AND ANNEALING TREATMENT

机译:脉冲电镀和退火处理制备黄铜矿CuInSe2薄膜

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CuInSe2 (CIS) thin films have been prepared on molybdenum substrates by pulse-plating electrodeposition from an aqueous solution containing CuCl2, InCl3, SeO2 and Na-citrate. The most suitable pulse potential range for co-deposition is found to be -0.6~-0.75V vs the saturated calomel electrode (SCE) . The electrodeposited films were characterized by X-ray diffraction (XRD), scanning electron microscopy (SEM) and energy dispersive X-ray analysis (EDS). The influence of the square pulse potential on crystallinity, surface morphology and compositions has been studied. Chalcopyrite phase CuInSe2 films with smooth surfaces and stoichiometric composition have been obtained at a pulse potential of -0.65~-0.7V vs.SCE and annealing treatment.
机译:已经通过从包含CuCl2,InCl3,SeO2和柠檬酸钠的水溶液中进行脉冲电镀电沉积,在钼基板上制备了CuInSe2(CIS)薄膜。发现相对于饱和甘汞电极(SCE),最适合共沉积的脉冲电势范围为-0.6〜-0.75V。通过X射线衍射(XRD),扫描电子显微镜(SEM)和能量色散X射线分析(EDS)对电沉积膜进行表征。已经研究了方波脉冲电势对结晶度,表面形态和组成的影响。在-0.65〜-0.7V vs.SCE的脉冲电势下,得到了具有光滑表面和化学计量组成的黄铜矿相CuInSe2薄膜,并进行了退火处理。

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