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Making Dense Coatings with the Solution Precursor Plasma Spray Process

机译:用溶液前体等离子体喷涂工艺制备致密涂层

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The Solution Precursor Plasma Spray process allows thecreation of coatings directly from chemical precursors, thusavoiding the task of making sprayable powders. To date, ourresearch has been based on injecting chemical precursors intoa DC plasma torch. The process has proven to be useful inmaking vertically cracked thermal barrier coatings and hasshown special advantages for making thick thermal barriercoatings (up to 4 mm). More recently, the process has beenmodified to produce dense, crack free coatings. Thisdevelopment was enabled by an improved understanding ofthe process, including making a coating almost exclusivelyfrom ultra-fine splats and avoiding the formation of verticalcracks. A crack free, dense alumina-yttria stabilized zirconiacoating has been produced which is 98% dense and has anaverage Vickers hardness (300 gf) of 1177.
机译:溶液前体等离子体喷涂工艺允许 直接从化学前体创建涂料,从而 避免制作可喷涂粉末的任务。迄今为止,我们的 研究基于注入化学前体 直流等离子体火炬。该过程已被证明是有用的 制造垂直破裂的热障涂层并具有 显示制造厚热屏障的特殊优点 涂料(最多4毫米)。最近,该过程一直在 改性以产生致密,裂纹的自由涂料。这 通过改善的理解,发展是通过的 该过程,包括几乎完全制作涂层 来自超细Splats并避免垂直形成 裂缝。无裂缝,致密的氧化铝 - yttra稳定氧化锆 生产的涂层是98%的密集,并且有一个 平均维氏硬度(300 GF)为1177。

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