Coulomb interactions between dust particles in plasma etchingreactors

摘要

Summary form only given. We discuss results from a computer modelfor dust particle transport in reactive ion etching discharges whereparticle-particle Coulomb interactions are included. The basis of thisstudy is a previously described dust transport simulation (DTS) whichcalculates particle trajectories by integrating the equations of motiondue to the sum of the appropriate forces. Debye shielded Coulombinteractions between dust particles have been added to the DTS on aparticle-by-particle basis. Results from the DTS indicate thatparticle-particle interactions modify trapping locations from localizedpoints to extended sheets. Clouds or domes of particles typicallyobserved above wafers are largely a consequence of particle-particleinteractions which redistribute particles on nearly equipotentialsurfaces