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FABRICATION OF 3-D PHOTONIC BANDGAP STRUCTURES ON SILICON USING LASER ASSISTED-NANOIMPRINTING

机译:激光辅助纳米压印法在硅上制备3-D光子带隙结构

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A new approach to fabricate 3-D photonic bandgap structures on silicon substrates using colloidal crystals and laser-assisted nanoimprinting is presented. Self assembly was used to deposit two layers of silica micro particles with a diameter of 0.97 μm. A KrF excimer laser beam with a wavelength of 248 nm was vertically irradiated on the quartz plate placed on the silicon substrate containing two layers of silica particles. The silica particles were imprinted into silicon substrate by the quartz plate during the laser pulse irradiation. Ultrasonic cleaning and hydrofluoric-acid (HF) solution were then used to remove the silica particles. 3-D hemispherical cavities were formed on the silicon substrate surface.
机译:制造3D光子带隙的新方法 胶体在硅衬底上的结构 晶体和激光辅助的纳米压印是 提出了。自组装用于沉积两个 直径为 0.97微米KrF准分子激光束具有 垂直照射248 nm的波长 放置在硅基板上的石英板 包含两层二氧化硅颗粒。二氧化硅 粒子被压印到硅基板上 石英板在激光脉冲照射过程中。 超声波清洗和氢氟酸(HF) 然后将溶液用于除去二氧化硅颗粒。 3-D半球形腔形成在 硅基板表面。

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