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Recent progress and future prospects of GaN HEMTs for base-station applications

机译:GaN HEMT在基站应用中的最新进展和未来前景

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This paper describes the recent progress and future prospects of GaN high electron mobility transistors (HEMTs) for 3G-wireless base station applications. It introduces a summary of most important activities at several organizations all over the world. As the Fujitsu progress, a state-of-the-art 250-W AlGaN/GaN-HEMTs push-pull transmitter amplifier operated at a drain bias voltage of 50 V is addressed. The amplifier, combined with a digital pre-distortion (DPD) system, also achieved an adjacent channel leakage power ratio (ACLR) of less than -50 dBc for 4-carrier W-CDMA signals with a drain supply voltage of 50 V. This paper also demonstrates a stable operation under RF stress testing for 1000 h at a drain bias voltage of 60 V. After comparing LDMOS, GaAs and GaN, future prospects of GaN-HEMT is discussed to verify that an AlGaN/GaN HEMTs amplifier is suitable for 3G W-CDMA systems.
机译:本文介绍了用于3G无线基站应用的GaN高电子迁移率晶体管(HEMT)的最新进展和未来前景。它概述了全球多个组织的最重要活动。随着富士通的发展,致力于在250 V的漏极偏置电压下工作的最先进的250 W AlGaN / GaN-HEMT推挽式发射机放大器。该放大器与数字预失真(DPD)系统相结合,还为漏极电压为50 V的4载波W-CDMA信号实现了小于-50 dBc的相邻信道泄漏功率比(ACLR)。该论文还展示了在60 V的漏极偏置电压下经过1000小时的RF应力测试可以稳定运行的情况。在比较LDMOS,GaAs和GaN之后,讨论了GaN-HEMT的未来前景,以验证AlGaN / GaN HEMT放大器适合用于3G W-CDMA系统。

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