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Electrical and optical properties of silicon quantum dots light-emitting diode by using highly doped ZnO

机译:高掺杂ZnO硅量子点发光二极管的电学和光学特性

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摘要

A light emitting diode (LED) with transparent doping layer (TDL) is fabricated. The I-V characteristics and the electroluminescence intensity of a LED with TDL significantly increase more than that of a LED without TDL. The improvement of optical and electrical properties is attributed to the excellent carrier injection through the n-ZnO layer into Si quantum dots embedded in silicon nitride film and the reduction of the electrical contact resistance with n-ZnO layer between metal and silicon nitride film.
机译:制造具有透明掺杂层(TDL)的发光二极管(LED)。具有TDL的LED的I-V特性和电致发光强度比没有TDL的LED的I-V特性和电致发光强度显着提高。光学和电学性质的改善归因于通过n-ZnO层将优异的载流子注入氮化硅膜中嵌入的Si量子点,以及金属与氮化硅膜之间与n-ZnO层的电接触电阻降低。

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