PRINT ABILITY OF OPAQUE AND CLEAR PHASE-DEFECTS USING THE FINITE-DIFFERENCE TIME-DOMAIN (FDTD) METHOD

摘要

The defect printability for two types of patterns isolated lines and contact holes was studied through a finite-difference time-domain (FDTD) computer simulation approach at the EUV wavelength of 13.5 nm. A three-dimensional FDTD solver was employed for aerial image analysis to assess the overall acceptable defect size for both opaque as well as clear phase defects for the 32 nm technology node.