A method for rapid screening of Photoresist Strippers for acceptance in DUV Lithographic areas

摘要

Airborne contaminants have been shown to cause image degradation to acid-catalyzed chemically amplified resists at low concentrations. In addition to mitigation measures, choices can be made to remove resist strippers from the DUV fab and eliminate those known to poison the resist. Such choices can be made based on the evaporative (airborne) alkalinity of the stripper. A method has been developed as a rapid technique for testing the airborne alkalinity strength of various resist strippers. This screening technique provides rapid information at minimal cost to qualify safe chemical strippers for the DUV fab. Experimental results on resist strippers to include commodities such as isopropanol, a cyclic ketone, amide, and specialty blends that contain amines as well as a high performance product, GenSolve~(TM).