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A trench-isolated power BiCMOS process with complementary high performance vertical bipolars

机译:具有互补高性能垂直双极的沟槽隔离电源BICMOS工艺

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摘要

A new process for mixed-signal and power management applications is introduced. The process architecture is designed to achieve high V{sub}A, high f{sub}T complementary 24V bipolar devices coupled to 0.5 μm CMOS and 24V power MOS. For optimum performance and die size the process uses 1 μm wide poly-filled trench isolation.
机译:介绍了混合信号和电源管理应用的新过程。该过程架构旨在实现耦合到0.5μmCMOS和24V功率MOS的高V {Sub} A,高F {Sub} T互补的24V双极装置。为了获得最佳性能和芯片尺寸,该过程使用1μm宽的多填充沟槽隔离。

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