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Magnetic Properties of SmCo Nano Films Grown by a Nd-YAG Pulsed Laser Ablation Method

机译:Nd-YAG脉冲激光烧蚀法生长的SmCo纳米膜的磁性

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Nanoscaled SmCo films were deposited on Si(100) substrate by a Nd-yAG pulsed laser ablation technique. The films were grown by either using the single target of Sm_100-xCo_x (75<=x<=93) at the substrate temperature of 600 approx 700 deg C, or thermal diffusion treatment of Co/Sm/Co multilayers deposited at the same temperatures. The magnetic films usually consisted of SmCO_5, and Sm_2Co_17 phases after the both processes. 4piM_s of the films consisting of SmCO_5+Sm_2Co_17 generally ranged over 5.0 approx 7.5 kG in common. However, coercivity values of the films were dependent upon the process employed. For the case of single target, a very high _iH_c(2 approx 6 kOe) was obtained from the films grown using the laser beam density of 1x10~5 J/cm~2, while a low coercivity(approx approx 200 Oe) was measured from the films grown using a low laser beam density(161 J/cm~2). This difference was discussed in terms of the formaiton of SmCO_5 droplets formed on the film surface
机译:通过Nd-yAG脉冲激光烧蚀技术将纳米级SmCo膜沉积在Si(100)衬底上。通过在600约700摄氏度的基板温度下使用Sm_100-xCo_x(75 <= x <= 93)的单个靶材或在相同温度下沉积的Co / Sm / Co多层膜进行热扩散处理来生长膜。在这两个过程之后,磁性膜通常由SmCO_5和Sm_2Co_17相组成。由SmCO_5 + Sm_2Co_17组成的薄膜的4piM_s通常共同在5.0到7.5 kG以上。但是,薄膜的矫顽力值取决于所采用的工艺。对于单靶的情况,从使用1x10〜5 J / cm〜2的激光束密度生长的薄膜中获得了很高的_iH_c(2约6 kOe),而测得的矫顽力很低(约200 Oe)。由使用低激光束密度(161 J / cm〜2)生长的薄膜制成。根据膜表面形成的SmCO_5液滴的形式讨论了这种差异

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