Development of advanced ArF resist using alicyclic methacrylate copolymer: the optimum quenchers for this copolymer

摘要

We have investigated alicyclic methacrylate copolymers for positive ArF resist. The resist utilizing developed copolymer had so high sensitivity and so high resolution that we could believe its potentiality to be high. When any quenchers were not added, the limited resolution of the developed resist was by 0.14 mu L/S. Therefore we carried out the investigation of quencher in order to improve the resolution of the resist. As a result, it found out that amide compounds wer effective as a quencher for this system, and a certain kind of an amide compound made the resist profiles good. Then we studied the relationship between the resist performance and the basicity or the polyarity of the basic organic compounds used as quencher.