Adhesion and dielectric strength of ultra-low dielectric constant PTFE thin films

机译：超低介电常数PTFE薄膜的附着力和介电强度

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Previous work has demonstrated the potential of polytetrafluoroethylene (PTFE) thin films for ULSI applications. The films are deposited from PTFE nanoemulsions. They have an ultra-low dielectric constatn of 1.7 to 2.0, a leakage current of less than 1.0 nA/cm~2

机译：先前的工作证明了聚四氟乙烯（PTFE）薄膜在ULSI应用中的潜力。膜由PTFE纳米乳液沉积而成。它们具有1.7至2.0的超低介电常数，泄漏电流小于1.0 nA / cm〜2

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《Symposium on low-dielectric constant materials》|1997年|p.231-236|共6页
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C.T.Rosenmayer; J.W.Bartz; J.Hammes;
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中图分类无线电电子学、电信技术;
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Adhesion and dielectric strength of ultra-low dielectric constant PTFE thin films

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