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Numerical simulation of the transient photoconductivity in a-Si:H as a function of the excitation density

机译:a-Si:H中瞬态光电导率与激发密度的函数关系的数值模拟

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The dependence of the transient photoconductivity induced by pulsed excitation (TPC) on the excitation desity is discussed with the help of numerical simulations.It is shown that recombination between excess mobile electrons and all excess holes (mainly localized) can explain the excitation density dependence o fthe TPC amplitude of standard a-Si:H at room temperature using a rate parameter K_BB of 10~-8 cm~3/s. This model leads to a decay faster than experimentally observed in the time range from 40 ns to 1 um s.A variation of the recombination model is presented that gives a better fit for the longer time range still showing the correct excitation density dependence in the short time range.Morecover comparison of the simulations with experimental data yields limits for the paameters of the conduction band tail.In particular,the time necessary to establish a dynamic equilibrium of excessw electrons between delocalized states in the conduction band and localized states in the tail appears to be very informative.
机译:借助数值模拟讨论了脉冲激发(TPC)引起的瞬态光电导与激发欲望的关系,结果表明,过量的流动电子与所有过量的空穴(主要是局部化的)之间的复合可以解释激发密度的依赖性。在室温下使用速率参数K_BB为10〜-8 cm〜3 / s的标准a-Si:H的TPC振幅。在40 ns至1 um s的时间范围内,该模型导致的衰变速度比实验观察到的快。提出了重组模型的变化,该模型对于较长的时间范围具有更好的拟合度,但仍显示出较短的时间范围内正确的激励密度依赖性。模拟与实验数据的更多发现比较限制了导带尾部的参数。特别是,在导带的离域态和尾部的局域态之间建立过量电子动态平衡所需要的时间似乎是非常有用。

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