Abstract: Germanosilicate film waveguides have been fabricated by plasma enhanced chemical vapor deposition. In the film waveguides straight waveguides, directional couplers and a Y-splitter were written directly point to point with UV-light by focussing a 244 nm beam by a single lens. No kind of mask was used to define the structure. The propagation loss of a multi-mode UV-written waveguide has been measured to 0.3 dB/cm, which is excellent for directly written waveguides. The UV-induced change of refractive index in the written components is estimated to be between 4 $DOT 10$+$MIN@3$/ and 6 $DOT 10$+$MIN@3$/. This provides a highly flexible and fast method for fabrication of new waveguide components.!7
展开▼
机译：摘要：通过等离子体增强化学气相沉积法制备了锗硅酸盐薄膜波导。在薄膜波导中，通过单个透镜聚焦244 nm的光束，直接波导，定向耦合器和Y型分束器直接用紫外光点对点写入。没有使用任何一种掩膜来定义结构。经测量，多模UV写入波导的传输损耗为0.3 dB / cm，这对于直接写入的波导而言非常出色。紫外线引起的书面组件中折射率的变化估计在4 $ DOT 10 $ + $ MIN @ 3 $ /和6 $ DOT 10 $ + $ MIN @ 3 $ /之间。这提供了一种高度灵活，快速的方法来制造新的波导组件。7
展开▼
