Abstract: Prototypes of micromachined tunable infrared optical filters are being produced. Micromachining silicon for use in these filters requires the integration of multilayer dielectric optical coatings such as ZnSe/ThF$-4$/. These coatings are novel materials for integration with microlithographic processing. Devices were engineered and a process flow was developed to avoid contaminating processing tools with the coating. A method for patterning the coating was developed. Low-temperature bonding techniques have been explored and tested. Fabrication issues for these micromachined devices are discussed. !5
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