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Passive damping to enhance active positioning of a prototype lithography platen

机译:被动阻尼可增强原型光刻平台的主动定位

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Abstract: A viscoelastic tuned-mass damper was used to suppress specific structural modes of a prototype lithography platen. The platen is magnetically levitated and it is repositioned and held in position by a closed-loop feedback control system. Important capabilities of the platen control system are precise positioning and rapid repositioning, which tend to require high frequency bandwidth. The high bandwidth excites structural vibration modes which are disruptive to the control system. The present work was to develop and demonstrate a means to suppress these modes using passive vibration damping techniques. The motivation is to increase the robustness of the platen positioning and control system by reducing unwanted modal accelerations excited by high control system bandwidth. Activities performed and discussed in this paper include the analytical design of viscoelastic tuned-mass dampers and the demonstration/testing of their effectiveness on the platen while levitated and controlled. !5
机译:摘要:粘弹性调谐质量阻尼器用于抑制原型光刻压板的特定结构模式。压板磁悬浮,并通过闭环反馈控制系统将压板重新放置并固定在适当的位置。压板控制系统的重要功能是精确定位和快速重新定位,这往往需要高频带宽。高带宽激发了结构振动模式,这对控制系统造成了破坏。当前的工作是开发和演示一种使用被动减振技术抑制这些模式的方法。其动机是通过减少由高控制系统带宽激发的不必要的模态加速度来提高压板定位和控制系统的鲁棒性。本文进行和讨论的活动包括粘弹性调谐质量阻尼器的分析设计,以及在悬浮和控制时在压板上演示/测试其有效性的方法。 !5

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