A self-isolated smart power process using only eight photolithographic steps has been developed. It allows the fabrication of high-voltage VDMOS and p-channel MOS transistors, a low-voltage CMOS logic, n-p-n bipolar transistors, diodes, Zeners, and high value capacitors. The VDMOS device is fabricated by a double diffused process and the same diffusion is used for the n-channel transistor well and for the VDMOS body. A process monitor chip has been fabricated and the different devices have been measured, showing the feasibility of such a technology and the excellent agreement with previously obtained simulation results.
展开▼
