首页> 外文会议>Conference on Optical Microlithography >Novel high-throughput micro-optical beam shapers reduce the complexity of macro-optics in hyper-NA illumination systems
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Novel high-throughput micro-optical beam shapers reduce the complexity of macro-optics in hyper-NA illumination systems

机译:新型高通量微光束整形器降低了超级照明系统中的宏观光学的复杂性

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Uniform illumination of the mask is a key factor for the lithography process. The requirements of Immersion Lithography make illumination systems even more complex e.g. by adding additional parameters like polarization and improved throughput. Arrays of refractive microoptics are the ideal solution for high transmission homogenizing elements since several tool generations. These arrays can provide very steep intensity profiles (top hat and other profiles), enable lossless polarization control and do not suffer from zero order losses like diffractive elements. Usually refractive microlens arrays are used with macrooptical field lenses in order to illuminate a field very uniformly or with a customized intensity distribution. High numerical apertures create the necessity for aspherical surfaces which leads to significantly higher lens cost especially for the macrooptics. In this paper we present novel microoptical homogenizers which create extremely uniform intensity distributions for high numerical apertures without any field lens or at least only with spherical field lenses. Especially multi-pole off-axis illumination can be improved with less optical components. An important prerequisite for these special types of homogenizers is that LIMO can produce free form surfaces on monolithic arrays larger than 200 mm with high precision and reproducibility. Every lens can be designed individually and can also be shaped asymmetrically. We will present surface test methods and the final UV tests, guaranteeing the performance for the applications. Example data gained with these tests will be shown with regard to: meeting the design parameters, reproducibility over one wafer and reproducibility in large lots. Monolithic elements based on crossed cylindrical lenses provide a fill factor close to 100%. Simulations and measurements prove that microoptic arrays can be produced which provide a uniformity of the homogenized laser light of significantly better than 1% P-V at numerical apertures above 0.35. Refractive microoptic arrays do not change the polarization state of the transmitted light which is an important prerequisite in immersion exposure tools. LIMO homogenizer sets are manufactured from fused silica and Calcium Fluoride thus they are suitable for all DUV wavelengths at highest laser fluxes.
机译:掩模的均匀照明是光刻过程的关键因素。浸入光刻的要求使照明系统更加复杂。通过添加偏振等附加参数和改进的吞吐量。折射微光学阵列是自几代工具以来高传输均质元素的理想解决方案。这些阵列可以提供非常陡峭的强度型材(顶部帽子和其他型材),使得无损偏振控制能够且不遭受差分元件的零级损失。通常,折射微透镜阵列与宏观领域透镜一起使用,以便非常均匀地或具有定制强度分布的领域。高数值孔为非球面表面的必要性,这导致显着更高的镜片成本,特别是宏观。在本文中,我们提出了新的微光学均质均质,其为高数值孔产生极其均匀的强度分布,而没有任何现场透镜或至少仅用球形场透镜。特别是多极偏离轴照明,光学部件较少。这些特殊类型的均化器的重要先决条件是豪华轿车可以在大于200mm的单片阵列上产生自由形状表面,具有高精度和再现性。每个镜头都可以单独设计,也可以不对称地形状。我们将呈现表面测试方法和最终UV测试,保证应用程序的性能。将在以下情况下显示使用这些测试的示例数据:满足设计参数,在大量晶片上的再现性和再现性。基于交叉圆柱透镜的整体元素提供接近100%的填充因子。模拟和测量证明可以生产微光学阵列,其在0.35以上的数值孔径上提供显着优于1%P-V的均质激光的均匀性。折射微光学阵列不会改变透射光的偏振状态,这是浸没式曝光工具中的重要前提。豪华摩均化器组由熔融石英和氟化钙制成,因此它们适用于最高激光通量的所有DUV波长。

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