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Circuit Models of Field Emission Silicon Diode and Transistor with a Nanoscale Vacuum Channel

机译:具有纳米级真空通道的场发射硅二极管和晶体管的电路模型

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Circuit models of field emission silicon diode and transistor with a nanoscale vacuum channel are presented. Parameters of the equivalent circuit of these vacuum devices such as parasitic resistances and capacitances have been calculated to make an analysis of the circuit performance. Models are based on the modified Fowler-Nordheim equation, taking into account the variation of field-enhancement factors from the geometric parameters at the nanoscale. Output current-voltage characteristics of the diode and transistor were calculated using SPICE simulator. The obtained results can found their practical application in the development of a new generation of nanoscale vacuum channel field emission devices.
机译:提出了具有纳米级真空通道的场发射硅二极管和晶体管的电路模型。这些真空装置的等效电路的参数,例如寄生电阻和电容,已经被计算出来,以分析电路性能。模型基于修改后的Fowler-Nordheim方程,并考虑了场增强因子与纳米级几何参数之间的差异。使用SPICE模拟器计算二极管和晶体管的输出电流-电压特性。所获得的结果可以在开发新一代纳米级真空通道场发射器件中找到实际应用。

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