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Arrayed metallic micro/nano particles for localized surface plasmon resonance based on metal contact transfer lithography

机译:基于金属接触转移光刻技术的阵列金属微/纳米粒子用于局部表面等离子体共振

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摘要

In this study, we demonstrate a rapidly, low cost, and mass production process to fabricate arrayed metallic nanoparticles on a variety of substrates based on contact transfer and metal mask embedded lithography (CMEL). A hexagonal arrayed metallic nanoparticles deployed on ITO/glass substrate with sub-micron periodicity is achieved. It is observed in optical transmittance measurements that noble metallic arrayed nanoparticles deployed on ITO/glass substrate result in a spectrally narrowband of extinction in visible range, and is in good agreement with the simulated results using finite-element method (FEM). It is found that the narrowband extinction spectrum is associated with electromagnetic field coupling between the arrayed metallic nanostructures and the ITO layer. This electromagnetic field coupling induces significant plasmon resonance in the ITO layer underneath the arrayed metallic nanostructures. Based on this observed phenomenon and our innovative large-area nano-fabrication processes, optoelectronic devices with arrayed metallic nanostructures can be easily designed and developed.
机译:在这项研究中,我们展示了一种快速,低成本和批量生产的工艺,该工艺可以基于接触转移和金属掩膜嵌入式光刻(CMEL)在各种基板上制造阵列化的金属纳米颗粒。实现了以亚微米周期性部署在ITO /玻璃基板上的六边形排列的金属纳米粒子。在光学透射率测量中观察到,部署在ITO /玻璃基板上的贵金属阵列纳米颗粒会导致可见光谱范围内的窄光谱消光带,并且与使用有限元方法(FEM)的模拟结果非常吻合。发现窄带消光光谱与阵列的金属纳米结构和ITO层之间的电磁场耦合有关。这种电磁场耦合在排列的金属纳米结构下面的ITO层中引起明显的等离子体共振。基于这种观察到的现象和我们创新的大面积纳米制造工艺,可以轻松设计和开发具有阵列金属纳米结构的光电器件。

著录项

  • 来源
    《》|2012年|p.339- 342|共4页
  • 会议地点 Kyoto(JP)
  • 作者

    Chung H. Y.;

  • 作者单位

    National Cheng Kung University, TAIWAN;

  • 会议组织
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类 特种结构材料;
  • 关键词

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