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Sharpening of the Pulse Front by a Silicon Pulse Switch

机译:硅脉冲开关使脉冲前锋锐化

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The switching process during the pulse sharpening by silicon diodes with the p+-p-n-n+ structure type and its different area: 0.16 cm2 and 0.09 cm2 was experimentally studied. A reverse polarity pulse with amplitude from 5.43 to 12.80 kV and an average front of 9 ns at the level of 0.25–0.90 was applied to one or two series-connected diodes installed in the gap of the central conductor of a 50-Ohm coaxial line. After the transition of the diode from the blocking to the conducting state, the pulses with amplitude of 1.05 to 4.91 kV with a front of about 1 ns were obtained in the line. Switching diodes occurs under the influence of a reverse voltage rate of less than 1 kVs. The result is obtained with diodes with the possibility of using in the mode of running wave in the nanosecond range.
机译:实验研究了具有p + -p-n-n +结构类型及其不同面积:0.16 cm2和0.09 cm2的硅二极管在脉冲锐化期间的开关过程。向安装在50欧姆同轴线中心导体间隙中的一个或两个串联连接的二极管施加振幅为5.43至12.80 kV,平均前沿为0.25-0.90的9 ns的反极性脉冲。在二极管从阻塞状态过渡到导通状态后,在线中获得振幅为1.05到4.91 kV的脉冲,其前沿约为1 ns。开关二极管受到小于1 kV / ns的反向电压速率的影响。使用二极管可以在纳秒范围内的运行波模式下获得结果。

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