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Beam Pattern Synthesis for Conformal Array with Sidelobe and Polarization Control: A Penalized Inequality Approach

机译:具有旁瓣和偏振控制的共形阵列的波束方向图综合:一种惩罚不等式方法

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Conformal array is attractive due to its flexibility to attach to different shape of surface. However, beam pattern synthesis for conformal array to control power side lobes and different polarization components for two dimensional angle space is a challenge, especially the degree of freedom is limited. In this work, we propose a robust beam pattern synthesis formulation for conformal array based on constrained convex optimization. By penalizing the maximum gain of cross-polarization component levels, power side lobes and different polarization components are controlled in a manner that the number of constraints is no longer limited by the array DoF. The proposed formulation is a convex second-order cone programming, a computationally efficient algorithm based on the alternating directions of multipliers method is designed to solve it. Simulations demonstrate the effectiveness of the proposed formulation to synthesize a desired pattern with robustness.
机译:保形阵列很吸引人,因为它可以灵活地附着在不同形状的表面上。然而,用于保形阵列以控制功率旁瓣和用于二维角度空间的不同偏振分量的波束图案合成是一个挑战,特别是自由度受到限制。在这项工作中,我们提出了一种基于约束凸优化的用于共形阵列的鲁棒波束方向图合成公式。通过补偿交叉极化分量电平的最大增益,以限制数量不再受阵列DoF限制的方式来控制功率旁瓣和不同的极化分量。所提出的公式是凸二阶锥规划,并设计了一种基于乘数交替方向的高效计算算法来求解。仿真证明了所提出的配方具有鲁棒性来合成所需图案的有效性。

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