首页> 外文会议>IEEE Photovoltaic Specialists Conference >Inorganic cesium-lead mixed halide perovskite p-i-n solar cells deposited using layer-by-layer vacuum deposition technique
【24h】

Inorganic cesium-lead mixed halide perovskite p-i-n solar cells deposited using layer-by-layer vacuum deposition technique

机译:层状真空沉积技术沉积无机铯铅混合卤化物钙钛矿p-i-n太阳能电池

获取原文

摘要

We report on the fabrication, electronic and device properties of inorganic cesium-lead mixed halide perovskite solar cells. The p-i-n devices were deposited using a layer-by-layer technique, where alternate layers of cesium bromide and lead iodide were deposited using vacuum deposition. The p-heterojunction layer was PTAA and the n-heterojunction layer was PCBM. It was discovered that in order to achieve the correct stoichiometry and get the best device performance, the individual thicknesses of each of the layers had to be small (4 nm and 6 nm respectively). Multiple stacks of alternating layers made up the device, with the total thickness of the perovskite to be about 400 nm.After deposition, the films were annealed at different temperatures to allow for diffusion and formation of the stoichiometric perovskite layer. It was found that when the individual layers were thin(e.g. 4 and 6 nm), one could obtain the stoichiometric perovskite by annealing at 250°C for 3 minutes, whereas thicker layers (e.g. 20 nm CsBr and 30 nm PbI2) needed annealing at higher temperatures (~350°C). The best devices were obtained by using thin alternating layers. The devices showed a voltage of 1.2 V, a current density of 12 mA/cm2 and a fill factor of 70% for a device efficiency of ~10%. Quantum efficiency spectroscopy showed a bandgap of 1.9 eV and sub-gap quantum efficiency revealed an Urbach energy of valence band tails to be ~20 meV.
机译:我们报告了无机铯铅混合卤化物钙钛矿太阳能电池的制造,电子和器件性能。使用逐层技术沉积p-i-n器件,其中使用真空沉积法沉积溴化铯和碘化铅的交替层。 p-异质结层是PTAA,n-异质结层是PCBM。已经发现,为了获得正确的化学计量并获得最佳的器件性能,每一层的单独厚度必须小(分别为4nm和6nm)。装置的多层交替堆叠构成了钙钛矿的总厚度为约400 nm。沉积后,将薄膜在不同温度下退火,以允许化学计量钙钛矿层的扩散和形成。发现当各层薄时(例如4和6 nm),可以通过在250°C退火3分钟获得化学计量的钙钛矿,而较厚的层(例如20 nm CsBr和30 nm PbI2)则需要在250°C退火。更高的温度(约350°C)。通过使用薄的交替层可以获得最佳的器件。器件显示电压为1.2 V,电流密度为12 mA / cm 2 填充系数为70%,器件效率约为10%。量子效率光谱显示带隙为1.9 eV,子带隙量子效率显示价带尾的Urbach能量为〜20 meV。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号