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Nanometer-Scale Imaging of Inhomogeneous Active Charge Carriers in Arsenic-Doped CdTe Thin Films

机译:砷掺杂CdTe薄膜中非均相活性载流子的纳米级成像

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We report nanometer-scale imaging of active carrier distribution of As-doped CdTe films by scanning capacitance microscopy (SCM). We developed SCM sample preparation for CdTe by ion-milling followed by thermal processing. The nanometer-resolution carrier delineation for CdTe was validated by imaging on a CdTe cross-section sample made by a molecular beam epitaxy layer stack with As-doping concentrations of 1015~1018/cm3. We found that the carrier distribution in As-doped films was significantly nonuniform, with inhomogeneity ranging from sub-μm to a few μm and concentration variation of one order of magnitude (low 1016 to low 1017/cm3). This nonuniformity is distributed randomly, independent of grain structure and grain boundary (GB). We used Kelvin probe force microscopy (KPFM) and cathodoluminescence (CL) to further map the surface potential and radiative illumination on the same area as the SCM image. Higher potential and lower CL intensity were found on GBs but not on SCM contrast, illustrating positive GB charging and GB recombination but not GB-distinguished doping. The overall KPFM potential image is in rough agreement with the SCM carrier distribution, in terms of Fermi-level position relative to the bandgap edge-thus resulting in the band-edge potential fluctuation. Nonuniform carrier concentration, potential fluctuation, and defect recombination can all together cause the Voc deficit of the As-doped CdTe device.
机译:我们报告了通过扫描电容显微镜(SCM)对掺As的CdTe薄膜的有源载流子分布进行了纳米级成像。我们通过离子铣削然后进行热处理开发了用于CdTe的SCM样品制备。通过在分子束外延层堆叠的As掺杂浓度为10的CdTe横截面样品上成像,验证了CdTe的纳米级载流子轮廓 15 〜10 18 /厘米 3 。我们发现,掺砷薄膜中的载流子分布明显不均匀,不均匀性从亚微米到几微米不等,浓度变化为一个数量级(低10 16 至低10 17 /厘米 3 )。这种不均匀性是随机分布的,与晶粒结构和晶界(GB)无关。我们使用开尔文探针力显微镜(KPFM)和阴极发光(CL)来进一步将表面电势和辐射照明映射到与SCM图像相同的区域。在GBs上发现了更高的电势和更低的CL强度,但在SCM对比上却没有,这说明了GB充电和GB重组为正,但没有GB区分的掺杂。就相对于带隙边缘的费米能级位置而言,整个KPFM电位图像与SCM载波分布大致吻合,从而导致了带边缘电位波动。载流子浓度不均匀,电势波动和缺陷复合都会共同导致As掺杂CdTe器件的Voc不足。

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