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Effects of Sputtering Gas on Crystal Growth Orientations and Durability of Al-doped ZnO Transparent Electrodes in Harsh Environment

机译:恶劣环境下溅射气体对掺Al ZnO透明电极晶体生长取向和耐久性的影响

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Aluminum-doped zinc oxide (AZO) transparent electrodes prepared by radio frequency (RF) magnetron sputtering were investigated to elucidate effects of crystal growth orientations on durability of AZO films, evaluated by electrical resistivity. During the deposition, the flow of oxygen gas was 60 sccm, while argon gas was varied from 3 to 60 sccm. As the argon gas flow increased, a transition of crystal growth orientations from (110) to (002) was observed by X-ray diffractometry (XRD). Damp heat test was conducted at 85°C and 85% of relative humidity for 25 days. As a result, the AZO films prepared with higher argon (or total) gas flows having (002) main crystal growth orientation exhibited better durability.
机译:通过电阻率评估,研究了通过射频(RF)磁控溅射制备的掺铝氧化锌(AZO)透明电极,以阐明晶体生长取向对AZO薄膜耐久性的影响。在沉积期间,氧气的流量为60sccm,而氩气为3至60sccm。随着氩气流的增加,通过X射线衍射法(XRD)观察到晶体生长取向从(110)到(002)的转变。湿热试验在85℃和相对湿度的85%下进行25天。结果,用具有(002)主晶体生长取向的更高的氩(或总)气流制备的AZO膜表现出更好的耐久性。

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