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Study on Transient Ionizing Radiation Effect of 40nm SRAM

机译:40nm SRAM的瞬态电离辐射效应研究

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This paper investigates the core voltage’s reduction of electronics induced by transient ionizing radiation and how it influences TREE (Transient Ionizing Radiation Effect of Electronics) on SRAM. 6T memory cell of 40nm SRAM was constructed in TCAD and the dose-rate upset threshold of it was 1.5×1011Gy(Si)/s when working at nominal core voltage. However, the transient ionizing radiation experiment of 40nm SRAM carried out on “QiangGuang-I” accelerator indicated that the dose-rate upset threshold of the whole SRAM chip was1.0×107 Gy(Si)/s. And the simulation results indicated that the reduction of memory cell’s core voltage would reduce the dose-rate upset threshold significantly as the memory cell’s SNM (Static Noise Margin) decreases with the reduction of memory cell’s core voltage. As there is LDO (Low Dropout Regulator) inside SRAM for conversion of voltage from I/O to core, we also did the transient ionizing radiation experiment of LDO and the experimental results showed that the output voltage of LDO would decrease during transient ionizing radiation which verified the probability of the reduction of memory cell’s core voltage during transient ionizing radiation. Combined with the experiment and simulation results, it can be assumed that the reduction of core voltage during radiation is a main reason causing SRAM upset.
机译:本文研究了瞬态电离辐射引起的电子器件的核心电压降低,以及它如何影响SRAM上的TREE(电子瞬态电离辐射效应)。在TCAD中构建了40nm SRAM的6T存储器单元,其剂量率失调阈值为1.5×10 11 在标称核心电压下工作时的Gy(Si)/ s。然而,在“强光一号”加速器上进行的40nm SRAM瞬态电离辐射实验表明,整个SRAM芯片的剂量率失调阈值为1.0×10 7 Gy(Si)/ s。仿真结果表明,随着存储单元核心电压的降低,存储单元的SNM(静态噪声容限)降低,存储单元核心电压的降低将显着降低剂量率失调阈值。由于SRAM内部有LDO(低压降稳压器)用于将电压从I / O转换为内核,因此我们还进行了LDO的瞬态电离辐射实验,实验结果表明LDO的输出电压在瞬态电离辐射过程中会降低,验证了瞬态电离辐射过程中存储单元核心电压降低的可能性。结合实验和仿真结果,可以假设辐射期间内核电压的降低是导致SRAM失调的主要原因。

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