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Tm:GdVO_4 microchip laser Q-switched by a Sb_2Te_3 topological insulator

机译:由Sb_2Te_3拓扑绝缘体调Q的Tm:GdVO_4微芯片激光器

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We report on the first application of a topological insulator based on antimony telluride (Sb_2Te_3) as a saturable absorber (SA) in a bulk microchip laser. The transmission-type SA consisted of a thin film of Sb_2Te_3 (thickness: 3 nm) deposited on a glass substrate by pulsed magnetron sputtering. The saturable absorption of the Sb_2Te_3 film was confirmed for ns-long pulses. The microchip laser was based on a Tm:GdVO_4 crystal diode-pumped at -802 nm. In the continuous-wave regime, this laser generated 3.54 W at 1905-1921 nm with a slope efficiency n of 37%. The Q-switched laser generated a maximum average output power of 0.70 W at 1913 nm. The pulse energy and duration were 3.5 μJ and 223 ns, respectively, at a repetition rate of 200 kHz. The Sb_2Te_3 SAs are promising for passively Q-switched waveguide lasers at -2 μm.
机译:我们报告了基于碲化锑(Sb_2Te_3)的拓扑绝缘体作为大体积微芯片激光器中的可饱和吸收剂(SA)的首次应用。透射型SA由通过脉冲磁控溅射沉积在玻璃基板上的Sb_2Te_3(厚度:3nm)的薄膜组成。对于ns长的脉冲,证实了Sb_2Te_3膜的饱和吸收。该微芯片激光器基于在-802 nm处泵浦的Tm:GdVO_4晶体二极管。在连续波状态下,该激光器在1905-1921 nm处产生3.54 W的光,其倾斜效率n为37%。调Q激光器在1913 nm处产生的最大平均输出功率为0.70W。在200 kHz的重复频率下,脉冲能量和持续时间分别为3.5μJ和223 ns。 Sb_2Te_3 SA有望用于-2μm的被动调Q波导激光器。

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