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Characterization of GaN-HEMT in cascode topology and comparison with state of the art-power devices

机译:共源共栅拓扑结构中GaN-HEMT的表征以及与最新功率器件的比较

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The paper presents a fully static and dynamic characterization and also reliability investigations of a 650V, 28mΩ GaN-HEMT in Cascode-topology. To show the overall performance of GaN-HEMT the output current per chip area (A per mm2) versus switching frequency of a three phase inverter is presented for the 650V GaN-HEMT in comparison to 650V Si-IGBT3 (IFX) and Si-CooLMOS C7 (IFX, with fast Si-FWD and SiC-FWD).
机译:本文介绍了在Cascode拓扑结构中650V,28mΩGaN-HEMT的完全静态和动态特性,以及可靠性研究。为了显示GaN-HEMT的整体性能,每个芯片面积的输出电流(每毫米A 2 与650V的Si-IGBT3(IFX)和Si-CooLMOS C7(具有快速Si-FWD和SiC-FWD的IFX)相比,提出了650V GaN-HEMT的三相逆变器的开关频率。

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