Patterning challenges for monolithic silicon photonics: AP/DFM: Advanced patterning / design for manufacturability

摘要

The curvilinear geometries of photonic devices are fundamentally different than the rectilinear designs of existing CMOS devices. In a monolithic integration of CMOS and photonic components, process changes to the conventional flow are required to accommodate the unique geometries of photonic devices. In this paper we discuss changes made in both fab processing and Optical Proximity Correction to improve the optical performance on a monolithic 90nm technology.