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Flow Boiling Heat Transfer of HFE7000 in Manifold Microchannels through Integrating Three-dimensional Flow and Silicon Nanowires

机译:通过集成三维流和硅纳米线在歧管微通道中HFE7000的流沸腾传热

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In this study we presented and characterized a compact silicon based manifold microchannel heat sink with embedded SiNWs in order to enhance heat transfer and reduce flow instability during two phase flow boiling. The manifold consists of parallel longitudinal microchannels etched in a silicon substrate and transverse microchannels etched on a transparent glass substrate. The microchannels in the silicon substrate were then etched with silicon nanowires. In this work, flow boiling heat transfer of HFE 7000 in such SiNWs embedded manifold microchannels were investigated. Two series of experiments with relatively small mass fluxes were carried out under different heat fluxes at a constant subcooled inlet temperature. The heat transfer and pressure drop characteristics were compared under different experimental conditions as well as the flow instability during the phase change process. A heat flux of about 141.5 W/cm2was reached with a relatively small mass flux of 116 kg/m2s. A remarkable performance of flow instability control was observed for HFE 7000 over both the single phase and the two-phase periods. Before the onset of nucleation, the temperature variations over a period of 100s are were about 0.2 °C. After the onset of nucleation, the maximum temperature fluctuations were still within 0.5 °C. This implies that our manifold microchannel design benefits from a strong impingement effect which delivers the coolant evenly to every corner of the hotspot and forms a more uniform temperature distribution.
机译:在这项研究中,我们介绍并表征了一种紧凑的基于硅的歧管微通道散热器,该散热器具有嵌入式SiNW,以增强热传递并减少两相流沸腾过程中的流量不稳定性。歧管由在硅基板上蚀刻的平行纵向微通道和在透明玻璃基板上蚀刻的横向微通道组成。然后用硅纳米线蚀刻硅衬底中的微通道。在这项工作中,研究了在此类SiNWs嵌入式歧管微通道中HFE 7000的沸腾传热。在恒定的过冷入口温度下,以不同的热通量进行了两个相对较小的质量通量的实验。比较了不同实验条件下的传热和压降特性,以及相变过程中的流动不稳定性。约141.5 W / cm的热通量 2 相对较小的质量通量达到了116 kg / m 2 s。对于HFE 7000,在单相和两相期间均观察到了出色的流动不稳定性控制性能。在成核开始之前,在100秒内的温度变化约为0.2°C。成核开始后,最大温度波动仍在0.5°C以内。这意味着我们的歧管微通道设计得益于强大的冲击效果,该效果将冷却剂均匀地输送到热点的每个角,并形成更均匀的温度分布。

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