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Fully Automated RF-Thermal Stress Workbench with S-Parameters Tracking for GaN Reliability Analysis

机译:带有S参数跟踪的全自动RF热应力工作台,用于GaN可靠性分析

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The rapid development of III-V technologies for telecommunication and radar markets need the meeting of performances (power, frequency) criteria as well as reliability assessment. Nitride HEMT technologies are known to reveal a large variety of failure electrical signatures, and it is also largely accepted that multi-tools (multi physics) approaches is the only suitable way to understand the failure mechanisms and to improve the technologies. Experimental stress workbenches usually allow to track a given number of static/dynamic parameters, but specific characterization are only performed at initial and final steps on the devices. This paper proposes a new approach with S-parameters measurement performed during RF stresses without removing the devices under test (in a thermally controlled oven). Then intermediate knowledge of the electrical (small signal) behavior of the devices can be assessed, and crossed with large-signal and static time-dependent signatures.
机译:用于电信和雷达市场的III-V技术的快速发展需要满足性能(功率,频率)标准以及可靠性评估。众所周知,氮化物HEMT技术可以揭示多种故障电子特征,并且也广泛接受多工具(多物理场)方法是理解故障机理和改进技术的唯一合适方法。实验应力工作台通常允许跟踪给定数量的静态/动态参数,但是特定的表征仅在设备的初始和最终步骤中执行。本文提出了一种新的方法,可以在RF应力下执行S参数测量,而无需移除被测设备(在热控烤箱中)。然后,可以评估设备的电气(小信号)行为的中间知识,并与大信号和静态时间相关的签名进行交叉。

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