Anomaly detection through on-line isolation Forest: An application to plasma etching

摘要

Advanced Monitoring Systems are fundamental in advanced manufacturing for control, quality and maintenance purposes. Nowadays, with the increasing availability of data in production and equipment, the need for high-dimensional Anomaly Detection techniques is thriving; anomalies are data patterns that have different data characteristics from normal production instances and that may be associated with faults or drifts in production. Tools for dealing with high-dimensional monitoring problems are provided by Machine Learning: in this paper, we test the performance of a state-of-the-art anomaly detection technique, called Isolation Forest, on a real industrial dataset related to Etching, one of the most important semiconductor manufacturing process. The monitoring has been performed exploiting Optical Spectroscopy Data.