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Figure of merit analysis of nanostructured thermoelectric materials at room temperature

机译:室温下纳米结构热电材料的性能分析图

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In this paper, we mainly focused on analyzing the thermoelectric property i.e. figure of merit of different nanostructured materials in room temperature (300-310 K). Here we studied the transition-metal dichalcogenides, particularly Molybdenum Disulfide (MoS2); Metal Oxides, specifically Zinc Oxide (ZnO); and conventional semiconductor materials, i.e. n-type and p-type Silicon (Si) and Silicon Germanium (SiGe). At first, we calculated the electrical conductance (Ge), by using electronic density functional theory (DFT). Similarly, we calculated the thermal conductance (κ) using Tersoff empirical potential (TEP) model. With these calculated values of Ge and κ and the Seebeck coefficient (S), we calculated the figure of merit (ZT) at different room temperatures. The main findings of our research were the increased ZT of MoS2, which is slightly larger than p-type Si while, 2~3 times larger than ZnO and 100~103 times larger than conventionally used SiGe and n-type Si at room temperatures. We have further investigated a thermoelectric generator (TEG) device with these materials to validate our result.
机译:在本文中,我们主要侧重于分析室温(300-310 K)下不同纳米结构材料的热电特性,即品质因数。在这里,我们研究了过渡金属二卤化物,特别是二硫化钼(MoS 2 );金属氧化物,特别是氧化锌(ZnO);常规的半导体材料,即n型和p型硅(Si)和硅锗(SiGe)。首先,我们使用电子密度泛函理论(DFT)计算了电导率(G e )。同样,我们使用Tersoff经验电势(TEP)模型计算了热导率(κ)。利用G e 和κ的这些计算值以及塞贝克系数(S),我们计算了不同室温下的品质因数(ZT)。我们研究的主要发现是MoS 2 的ZT升高,它比p型Si稍大,而ZnO则大2〜3倍,而10 0 〜在室温下,比传统使用的SiGe和n型Si大10 3 倍。我们进一步研究了使用这些材料的热电发生器(TEG)装置,以验证我们的结果。

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