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Re-consideration of Kirchhoff's Current Law for electromagnetic cloaking and invisibility with plasmonic materials or impedance metasurfaces

机译:重新考虑基尔霍夫电流定律关于电磁隐身和等离子材料或阻抗超表面的不可见性

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In the present paper, the Kirchhoff's Current Law (KCL) is re-considered as a cloaking condition for structures based on dielectric-plasmonic materials (Plasmonic Cloaking) and devices made up of metallic-dielectric metasurfaces (Mantle Cloaking). Consistently with Devaney-Wolf Theorem III on non-scattering sources, the KCL is derived by imposing zeros on scattered near-fields in the quasi-static limit: beyond the quasi-static regime, the KCL can represent a local condition on each unit cell of impedance metasurfaces. The aim of this paper is to introduce a unified physical-mathematical framework for invisibility and cloaking devices from a novel perspective based on contrast and impedance concepts.
机译:在本文中,重新考虑了基尔霍夫电流定律(KCL)作为基于介电等离子体材料的结构的隐蔽条件(等离子体隐蔽)和由金属介电超表面构成的器件的隐蔽条件(地幔隐蔽)。与非散射源上的Devaney-Wolf定理III一致,通过在准静态极限内对零散近场施加零来得出KCL:在准静态范围之外,KCL可以表示每个单位单元上的局部条件阻抗超表面。本文的目的是基于对比度和阻抗概念,从新颖的角度介绍一种用于隐形和隐身设备的统一物理数学框架。

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