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Wild band edges: The role of bandgap grading and band-edge fluctuations in high-efficiency chalcogenide devices

机译:禁带边缘:高效硫族化物器件中的禁带渐变和禁带边缘波动的作用

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Band-edge effects - including grading, electrostatic fluctuations, bandgap fluctuations, and band tails - affect chalcogenide device efficiency. These effects now require more careful consideration as efficiencies increase beyond 20%. Several aspects of the relationships between band-edge phenomena and device performance for NREL absorbers are examined. For Cu(In, Ga)Se2 devices, recent increases in diffusion length imply changes to the optimum bandgap profile. The origin, impact, and modification of electrostatic and bandgap fluctuations are also discussed. The application of the same principles to devices based on CdTe, kesterites, and emerging absorbers (Cu2SnS3, CuSbS2), considering differences in materials properties, is examined.
机译:带边缘效应(包括渐变,静电波动,带隙波动和带尾)会影响硫族化物器件的效率。随着效率增加超过20%,现在需要更仔细地考虑这些影响。研究了NREL吸收器的带边现象和器件性能之间关系的几个方面。对于Cu(In,Ga)Se2器件,最近扩散长度的增加暗示了最佳带隙分布的变化。还讨论了静电和带隙波动的起因,影响和修正。考虑到材料特性的差异,研究了相同原理在基于CdTe,kesterite和新兴吸收剂(Cu2SnS3,CuSbS2)的设备上的应用。

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